Reflection Film Thickness Meter

I. Product Introduction

The reflective film thickness gauge is an accurate and easy-to-use thin film thickness measurement device. It can measure ultra-thin films as thin as 20 nanometers, with a measurement error of less than 1 nanometer. It can measure up to 100 times per second, with repeat measurement accuracy as high as 0.05 nanometers. It uses a dual light source combination covering the full spectrum from ultraviolet to infrared, with strong anti-interference capability, and works stably even in vibration or complex environments.

II. Application Fields

Widely used in semiconductor and microelectronics manufacturing, display panels, optical device manufacturing, biomedicine, automotive and new materials and new energy R&D, it can meet the high-precision thickness inspection needs from wafer coating, display panel films, optical element coatings, medical implant coatings, automotive glass film layers to new energy films, helping various industries improve product quality and R&D efficiency.

III. Test Principle

The reflective film thickness gauge works on the principle of white light interference. Broadband light emitted by the light source is incident on the surface of the film to be measured; the two beams of reflected light formed by reflection from the upper and lower surfaces of the film interfere due to the optical path difference. The interference signal contains key information such as film thickness and optical constants. The device collects the interfered reflection spectrum through the probe, performs model fitting on the spectrum within a specific wavelength band, and then inversely resolves parameters such as film thickness, optical constants and roughness. The whole system uses a high-intensity combined light source to provide broadband incident light, transmits it to the sample through an optical system, collects the returned reflected light by a high-speed spectral module, and finally completes data processing and result output through host computer software.

IV. Product Features

1. Precise measurement: supports ultra-thin film thickness detection down to 20 nm, with accuracy of ±1 nm and repeat precision of 0.05 nm, meeting precision inspection requirements.

2. High-speed sampling: maximum sampling speed of 100 Hz, suitable for rapid production line inspection and improving measurement efficiency.

3. Wide spectral coverage: uses a deuterium-halogen combined light source, with spectral coverage from ultraviolet to near-infrared, capable of resolving single-layer/multi-layer film thickness.

4. Strong anti-interference: high-sensitivity components combined with an anti-interference optical system and multi-parameter inversion algorithm provide stable measurement in complex environments.

5. Flexible and easy to adapt: supports user-defined film structure measurement; the device is compact and easy to install, with supporting software and a secondary development kit, suitable for multiple laboratory/production line scenarios.

V. Technical Parameters